American lab is developing a BAT laser that could enable 'beyond EUV' lithography
The Lawrence Livermore National Laboratory is working on a petawatt-class thulium laser that is said to be 10 times more ...
tom's Hardware on MSN23h
American lab is developing a BAT laser that could enable 'beyond EUV' lithography, provide 10X power efficiency boost
The LLNL-led initiative will evaluate the Big Aperture Thulium (BAT) laser technology to enhance EUV source efficiency by ...