This paper describes the causes of yield drop out in deep submicron technologies and methods to improve yield at design and manufacturing stage of IC development cycle. The layout development is most ...
W/O deep Nwell. UMC 55nm ULP/HVT Low-K Logic Process Process 6-track ECO M1 Cell Library (C60). W/O deep Nwell UMC 55nm ULP/LVT Low-K Logic Process Process 6-track ECO M1 Cell Library (C60). W/O deep ...
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