This enables the EUV lithography era of today, which is likely to continue for the foreseeable future. Initially, EUV became ...

lithography equipment called "argon fluoride lithography machine," with core technical specifications of "300mm wafer diameter, 248nm illumination wavelength, resolution below 65nm, and alignment ...

EUV, extreme ultraviolet lithography, is nearly completely associated with the Dutch company ASML, the only maker of EUV machines that are used by TSMC ... which uses thulium-doped yttrium lithium ...